And dry etching the transition layer of the AMR film.
干法刻蚀各向异性磁电阻效应薄膜的过渡层。
The principle and the main parameters of the dry etching for silicon dioxide are introduced.
摘要阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数.
词典释义:
干法刻蚀
And dry etching the transition layer of the AMR film.
干法刻蚀各向异性磁电阻效应薄膜的过渡层。
The principle and the main parameters of the dry etching for silicon dioxide are introduced.
摘要阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数.
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