Cyclized polyisoprene rubber negative photoresist; ultraviolet negative photoresist

环化聚异戊二烯橡胶负性光刻胶

Jetting photoresist onto the substrate with nozzle;

利用喷嘴将光阻喷射至基板上；

This photoresist have thermal stabilityand high resolution.

该光刻胶具有热稳定性和高分辨率性.

Photoresist coating preparation and baking; Thin film preparation.

光刻胶的旋涂与烘烤，薄膜材料制备。

Main factors of influencing photoresist thickness for dip coating is analysed in this paper. The thickness of photoresist is determined by it.

分析了提拉法涂胶中影响胶膜厚度的主要因素，并据此确定出胶膜厚度；

Aqueous solution as the developer the photoresist can be of negative tone.

用氢氧化钠-乙醇水溶液显影可以得到负性光刻图形；

This paper researches the influence of resin and wetting agent for the property of photoresist.

本论文研究了光阻剂中分别增加环氧树脂和润湿剂对其性能的影响。

Forming a hard mask layer and a patterned photoresist layer on the semiconductor substrate;

图案化该光致抗蚀剂层以形成一第一开口；

Using the alkali-ethanol aqueous solution as the developer the photoresist can be of negative tone.

用氢氧化钠-乙醇水溶液显影可以得到负性光刻图形；

This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging.

本文介绍一种氩离子激光直接成像化学增幅感光树脂.